Recent results on manufacturing spin and superconducting qubits in advanced 300 mm fabrication environments

In this talk, we will report on recent progress in manufacturing spin and superconducting qubits using advanced 300 mm manufacturing lines at imec. Both progress on Si MOS qubits and demonstrations of Si/SiGe spin qubits will be discussed, as well as the realization of high coherence superconducting transmon qubits using subtractively etched junctions, bypassing the need for shadow evaporation.

We will comment on the challenges and benefits of moving such qubits to a 300 mm fab environment, and the challenges and opportunities offered with respect to upscaling of the technology.