Gate-Tunable Conductivity and Impurity Scattering in Molecule-Decorated Graphene Devices

ORAL

Abstract

We investigate how molecular adsorbates influence charge transport in gate-tunable graphene field-effect transistors. Using scanning tunneling microscopy and transport measurements performed on F4TCNQ-decorated graphene, we directly correlate nanoscale molecular configurations with macroscopic conductivity. The experiments reveal strong asymmetry between electron and hole conduction and a pronounced deviation from the carrier-density dependence expected for pristine graphene. Theoretical analysis shows that these effects arise from charge-transfer-induced scattering and hybridization between molecular orbitals and graphene's Dirac bands. By systematically varying the gate voltage and molecular coverage, we demonstrate tunable transitions between Fermi level pinning and resonant impurity scattering regimes, linking molecular adsorption, charge state, and device performance. Together, these findings provide a microscopic picture of how individual molecular impurities reshape electronic transport in two-dimensional materials, offering key insights into the coupling between molecular orbitals and graphene's electronic structure.

*This research was supported by the Director, Office of Science, Office of Basic Energy Sciences, Materials Sciences and Engineering Division, of the US Department of Energy under contract no. DE-AC02-05CH11231 (Nanomachine program-KC1203) (STM imaging of diffusion processes), and by the Molecular Foundry (device fabrication). K.W. and T.T. acknowledge support from the JSPS KAKENHI (Grant numbers 21H05233 and 23H02052) and World Premier International Research Center Initiative (WPI), MEXT, Japan for the development of BN crystals. F.L. acknowledges support from the Kavli ENSI Philomathia Graduate Student Fellowship. We acknowledge funding from the Thomas Young Centre under grant number TYC-101 and the Imperial College London Research Computing Service (DOI:10.14469/hpc/2232) for computational resources used in carrying out this work.

Presenters

  • Hsin-Zon Tsai

    • National Cheng Kung University, R.O.C., University of California at Berkeley, United States

Authors

  • Hsin-Zon Tsai

    • National Cheng Kung University, R.O.C., University of California at Berkeley, United States
  • Franklin Liou

    • University of California, Berkeley
  • Yiming Yang

    • University of California, Berkeley
  • Andrew S Aikawa

    • University of California, Berkeley
  • Kenji Watanabe

    • National Institute for Materials Science
    • Research Center for Functional Materials, National Institute of Materials Science, 1-1 Namiki Tsukuba, Ibaraki 305-0044, Japan
  • Takashi Taniguchi

    • National Institute for Materials Science
    • Research Center for Materials Nanoarchitectonics, National Institute for Materials Science
    • International Center for Materials Nanoarchitectonics, National Institute of Materials Science, 1-1 Namiki Tsukuba, Ibaraki 305-0044, Japan
    • Research Center for Functional Materials, National Institute of Materials Science, 1-1 Namiki Tsukuba, Ibaraki 305-0044, Japan
  • feng wang

    • University of California, Berkeley
  • Johannes Lischner

    • Imperial College London, U.K.
  • Michael F Crommie

    • University of California, Berkeley