Band-to-band transitions, and ultraviolet dielectric functions of unintentionally-doped (x = 0 . . . 0.3) and Silicon doped (x = 0 . . . 0.25) single crystal (100) β-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub>

ORAL

Abstract

The monoclinic beta phase of gallium oxide is an ultra-wide bandgap semiconductor that has been widely studied for potential use in high power switching applications. Advances in crystal growth techniques enable us to investigate high quality β-(AlxGa1−x)2O3 films and bulk substrates. For the first time, the properties of unstrained bulk substrates are investigated, permitting for the decoupling of the effects of strain and the native properties of the lattice. Understanding the fundamental properties of the substrates also permits the investigation of compressive and tensile strain of epitaxial β-(Aly Ga1−y )2O3 or β-Ga2O3 on a different solid solution β-(AlxGa1−x)2O3 crystal substrate, which has not yet been done.

Here, we study β-(AlxGa1−x)2O3 (x = 0.05, 0.1, 0.15, 0.2, 0.25, and 0.3) and Silicon doped (x = 0.05, 0.1, 0.15, 0.2, and 0.25) both with (100) surface orientation. Bulk β-(AlxGa1−x)2O3 crystals were grown by the Czochralski method using Ir crucibles and oxidizing atmosphere. We present model dielectric functions in the near ultraviolet to the vacuum ultraviolet. We investigate the changes in the optical bandgap and band-to-band transitions associated with the increasing aluminum concentration. We compare the results to our previous work done on an additional sample set of pseudomorphically strained β-(AlxGa1−x)2O3 films on (010) β-Ga2O3, with aluminum molar content up to 21%. We contrast the data obtained from the doped samples to the unintentionally-doped samples to resolve the effects of doping on free charge carrier concentration, bandgap, and higher photon energy band-to-band transitions.

*Support is acknowledged by the National Science Foundation under awards CMMI 2211858, DMR2224456, ECCS 2329940, DMR 2423277, and OIA-2044049 Emergent Quantum Materials and Technologies (EQUATE), byAir Force Office of Scientific Research under awards FA9550-18-1-0360, FA9550-19-S-0003, FA9550-21-1-0259, and FA9550-23-1-0574 DEF, and by the University of Nebraska Foundation. M.S. acknowledges support from the J. A. Woollam Foundation.

Publication: [1] Z. Galazka, et al., J. Appl. Phys. 133, 037502 (2023).
[2] M. Schubert, et al., Phys. Rev. B 93, 125209 (2016).
[3] M. Schubert, et al., Phys. Rev. B 99, 041201(R) (2019).
[4] R. Korlacki, et al., Phys. Rev. B 102, 180101(R) (2020).
[5] R. Korlacki, et al., Phys. Rev. Applied 18, 064019 (2022).
[6] M. Stokey, R. Korlacki, et al., In Preparation.
[7] M. Hilfiker, et al., Appl. Phys. Lett. 114, 231901 (2019).

Presenters

  • Preston Sorensen

    • University of Nebraska-Lincoln

Authors

  • Preston Sorensen

    • University of Nebraska-Lincoln
  • UFUK KILIC

    • University of Nebraska - Lincoln
  • Megan Stokey

    • Milwaukee School of Engineering
  • Rafal Korlacki

    • J.A. Woollam Co, Inc.
    • J.A. Woollam Co., Inc.
  • Vallery Stanishev

    • Lund University
  • Vanya Darakchieva

    • Lund University
  • Zbigniew Galazka

    • Leibniz-Intsitut fur Kristallzuchtung
    • Leibniz-Institut für Kristallzüchtung
  • Mathias Schubert

    • University of Nebraska-Lincoln
    • University of Nebraska Lincoln
    • Lund Univ/Lund Inst of Tech